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Author: thomas germer

Displaying records 131 to 140 of 159 records.
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131. Polarized Light Scattering Measurements of Roughness, Subsurface Defects, Particles, and Dielectric Layers on Silicon Wafers, ed. by F. Obelleiro, J.L. Rodr{iacute}guez, and T. Wriedt
Published: 1/1/1999
Authors: Thomas Avery Germer, L Sung
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104496

132. Polarized Light-Scattering Measurements of Dielectric Spheres upon a Silicon Surface
Published: 1/1/1999
Authors: L Sung, G W Mulholland, Thomas Avery Germer
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104217

133. The Three Components of Reflection
Published: 10/1/1998
Authors: Edward D. Kelley, George R Jones, Thomas Avery Germer
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=11928

134. Polarization of Out-of-Plane Optical Scatter From SiO^d2^ Films Grown on Photolithographically-Generated Microrough Silicon
Published: 7/1/1998
Authors: Thomas Avery Germer, B W Scheer
Abstract: Bi-directional ellipsometry results are presented for scatter from SiO^d2^ films grown on photolithographically produced microrough silicon surfaces. The principle direction of the polarization and the degree of linear polarization for scatter direc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841294

135. Display Reflectance Model Based on the BRDF
Published: 6/1/1998
Authors: Edward D. Kelley, George R Jones, Thomas Avery Germer
Abstract: Many flat panel displays (FPDs) permit anti-reflection surface treatments that differ in character from those of traditional cathode-ray-tube displays. Specular reflection models (mirror-like, producing a distinct image) combined with diffuse (Lambe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=24685

136. Application of Bidirectional Ellipsometry to the Characterization of Roughness and Defects in Dielectric Layers
Published: 4/1/1998
Author: Thomas Avery Germer
Abstract: The polarization of light scattered into directions out of the plane of incidence is calculated for microroughness, defects, or particles in or near a dielectric film on a substrate. The theories for microroughness and Rayleigh scatter in the presen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841269

137. Polarized Light Scattering and its Application to Microroughness, Particle, and Defect Detection
Published: 3/1/1998
Author: Thomas Avery Germer
Abstract: In this paper, I will discuss the theory and application of polarized light scatter. Recent measurements have shown that some sources of scatter, including microroughness and subsurface defects, have well-defined polarizations for any specific pair ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841276

138. Application of bidirectional ellipsometry to the characterization of roughness and defects in dielectric layers, ed. by J. C. Stover
Published: 1/1/1998
Author: Thomas Avery Germer
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104498

139. Display Reflectance Model Based on the BRDF
Published: 1/1/1998
Authors: E F Kelley, G R Jones, Thomas Avery Germer
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=103932

140. Polarization of out-of-plane optical scatter from SiO^d2^ films grown on photolithographically-generated microrough silicon, ed. by Z.H. Gu and A.A. Maradudin
Published: 1/1/1998
Authors: Thomas Avery Germer, B W Scheer
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104497



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