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You searched on: Author: joseph fu

Displaying records 11 to 20 of 73 records.
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11. Influence of room temperature control system on AFM imaging
Published: 10/1/2009
Authors: Joseph Fu, Wei Chu, Theodore Vincent Vorburger
Abstract: As technology progresses, the control of environment for experiments is also getting more sophisticated; such as the control of lab temperature and vibration. Temperature controlled within ± 0.25° C for a general purpose lab is common place. We illus ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901426

12. A moving window correlation method to reduce the distortion of SPM images
Published: 8/20/2009
Authors: Wei Chu, Joseph Fu, Ronald G Dixson, Ndubuisi George Orji, Theodore Vincent Vorburger
Abstract: Many scanning probe microscopes (SPMs), such as the scanning tunneling microscope (STM) and atomic force microscope (AFM), use piezoelectric actuators operating in open loop for generating the scans of the surfaces. However, nonlinearities mainly cau ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901732

13. Reference Metrology in a Research Fab: The NIST Clean Calibrations Thrust
Published: 4/12/2009
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Thomas B Renegar, Xiaoyu A Zheng, Theodore Vincent Vorburger, Albert M. Hilton, Marc J Cangemi, Lei Chen, Michael A. Hernandez, Russell E Hajdaj, Michael R Bishop, Aaron Cordes
Abstract: In 2004, the National Institute of Standards and Technology (NIST) commissioned the Advanced Measurement Laboratory (AML) ‹ a state-of-the-art, five-wing laboratory complex for leading edge NIST research. The NIST NanoFab ‹ a 1765 m2 (19,000 ft2) cl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902187

14. Nano- and Atomic-Scale Length Metrology
Published: 12/14/2007
Authors: Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Ndubuisi George Orji, Shaw C Feng, Michael W Cresswell, Richard A Allen, William F Guthrie, Wei Chu
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824603

15. Photomask Applications of Traceable Atomic Force Microscope Dimensional Metrology at NIST
Published: 10/1/2007
Authors: Ronald G Dixson, Ndubuisi George Orji, James Edward Potzick, Joseph Fu, Michael W Cresswell, Richard A Allen, S J Smith, Anthony J Walton
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in AFM dimensional metrology.  Two major instruments are being used for traceable measurements.  The first is a custom in-house metrology AFM, called the c ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823242

16. Application of Carbon Nanotube Probes in a Critical Dimension Atomic Force Microscope
Published: 3/1/2007
Authors: B C. Park, J Choi, S J Ahn, D H Kim, L Joon, Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Theodore Vincent Vorburger
Abstract: The ever decreasing size of semiconductor features demands the advancement of critical dimension atomic force microscope (CD-AFM) technology, for which the fabrication and use of more ideal probes like carbon nanotubes (CNT) is of considerable intere ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823234

17. Computational Models of the Nana Probe Tip for Static Behaviors (Abstract Only)
Published: 2/1/2007
Authors: Shaw C Feng, Theodore Vincent Vorburger, Che B. Joung, Joseph Fu, Ronald G Dixson, Li Ma
Abstract: As integrated circuits become smaller and faster, the measurement of line width must have less uncertainty and more versatility. The common requirement for uncertainty is less than 10 nanometers. The industrial need for versatility is three dimension ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822658

18. 3D Image Correction of Tilted Sample Through Coordinate Transformation
Published: 1/1/2007
Authors: Wei Chu, Joseph Fu, Ronald G Dixson, Theodore Vincent Vorburger
Abstract: In scanned probe measurements of micrometer- or nanometer-scale lines, it is nearly impossible to maintain the sample in a perfectly level position, and even a small amount of tilt angle can contribute to the accuracy of the result of measurand such ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823244

19. A Time-Resolved Kinetic Monte-Carlo Simulation Study On Si (111) Etching
Published: 1/1/2007
Authors: Hui H. Zhou, Joseph Fu, Richard M Silver
Abstract: In this paper we have extended the Kinetic Monte-Carlo simulation method to study the etching dynamics of Si (111) surfaces in NH4F in a time-resolved basis. We have examined the step-flow dynamics of Si(111) etching using various simulation window s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823196

20. Linewidth Measurement Based on Automatically Matched and Stitched Images
Published: 1/1/2007
Authors: Wei Chu, Joseph Fu, Ronald G Dixson, Theodore Vincent Vorburger
Abstract: The emergence of ultra-sharp carbon nanotube (CNT) tips provides a new approach to minimize the distortion of the measured linewidth profile caused by interaction with the fmite probe tip size. However, the inevitable tilt angle resulting from attach ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824614