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You searched on: Author: ronald dixson

Displaying records 71 to 80 of 122 records.
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71. Traceable Calibration of Critical-Dimension Atomic Force Microscope Linewidth Measurements with Nanometer Uncertainty
Published: 11/30/2005
Authors: Ronald G Dixson, Richard A Allen, William F Guthrie, Michael W. Cresswell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32210

72. The Study of Silicon Stepped Surfaces as Atomic Force Microscope Calib Standards With a Calibrated AFM at NIST
Published: 9/29/2005
Authors: V W. Tsai, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, R Koning, Richard M Silver, Edwin Ross Williams
Abstract: Due to the limitations of modern manufacturing technology, there is no commercial height artifact at the sub-nanometer scale currently available. The single-atom steps on a cleaned silicon (111) surface with a height of 0.314 nm, derived from the lat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820918

73. Critical Dimension Reference Features with Sub-Five Nanometer Uncertainty
Published: 5/30/2005
Authors: Michael W. Cresswell, Ronald G Dixson, William F Guthrie, Richard A Allen, Christine E. Murabito, Brandon Park, Joaquin (Jack) Martinez, Amy Hunt
Abstract: The implementation of a new type of HRTEM-imaging (High-Resolution Transmission Electron Microscopy) test structure, and the use of CD-AFM (CD-Atomic Force Microscopy) to serve as the transfer metrology have resulted in reductions in the uncertaintie ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31923

74. Comparison of SEM and HRTEM CD-Measurements Extracted from Monocrystalline Tes-Structures Having Feature Linewidths from 40 nm to 240 nm
Published: 4/18/2005
Authors: Michael W. Cresswell, Brandon Park, Richard A Allen, William F Guthrie, Ronald G Dixson, Wei Tan, Christine E. Murabito
Abstract: CD measurements have been extracted from SEM and HRTEM images of the same set of monocrystalline silicon features having linewidths between 40 and 200 nm. The silicon features are incorporated into a new test structure which has been designed to faci ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31907

75. Comparison of SEM and HRTEM CD-Measurements Extracted From Monocrystalline Tes-Structures Having Feature Linewidths From 40 nm to 240 nm
Published: 4/4/2005
Authors: W Tan, Robert Allen, Michael W. Cresswell, Christine E. Murabito, B C. Park, Ronald G Dixson, William F Guthrie
Abstract: CD measurements have been extracted from SEM and HRTEM images of the same set of monocrystalline silicon features having linewidths between 40 and 200 nm. The silicon features are incorporated into a new test structure which has been designed to faci ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822390

76. Report of Investigation of RM 8111: Single-Crystal Critical Dimension Prototype Reference Materials
Published: 3/2/2005
Authors: Michael W. Cresswell, Richard A Allen, Ronald G Dixson, William F Guthrie, Christine E. Murabito, Brandon Park, Joaquin (Jack) Martinez
Abstract: Staff of the Semiconductor Electronics Division, the Information Technology Laboratory, and the Precision Engineering Laboratory at NIST, in collaboration with VLSI Standards, Inc., of San Jose, California, have developed a new generation of prototyp ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31868

77. CD-AFM Reference Metrology at NIST and SEMATECH
Published: 2/27/2005
Authors: Ronald G Dixson, Jing Fu, Ndubuisi G Orji, William F Guthrie, Richard A Allen, Michael W. Cresswell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32108

78. Dimensional Metrology with AFM
Published: 1/1/2005
Authors: T Mcwaid, J Schneir, Ronald G Dixson, V W. Tsai
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820749

79. Line Edge Roughness Metrology Using Atomic Force Microscopes
Published: 1/1/2005
Authors: Ndubuisi George Orji, Theodore Vincent Vorburger, Joseph Fu, Ronald G Dixson, C Nguyen, Jayaraman Raja
Abstract: Line edge roughness measurements using two types of atomic force microscopes and two types of tips are compared. Measurements were made on specially prepared samples with inscribed edge roughness of different amplitudes and wavelengths. The spatial w ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823182

80. Linewidth Measurement from a Stitched AFM Image
Published: 1/1/2005
Authors: Joseph Fu, Ronald G Dixson, Ndubuisi George Orji, Theodore Vincent Vorburger, C Nguyen
Abstract: Image stitching is a technique that combines two or more images to form one composite image, which provides a field of view that the originals cannot.  It has been widely used in photography, medical imaging, and computer vision and graphics. &n ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823186



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