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Author: ronald dixson

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71. Reference Metrology Using a Next Generation CD-AFM
Published: 5/24/2004
Authors: Ronald G Dixson, Angela Guerry
Abstract: International SEMATECH (ISMT and the National Institute of Standards and Technology (NIST) are working together to improve the traceability of AFM dimensional metrology in semiconductor manufacturing. Due to the unique metrology requirements and the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822152

72. Interim Report on Single Crystal Critical Dimension Reference Materials (SCCDRM)
Published: 1/1/2004
Authors: Ronald G Dixson, Michael W Cresswell, Richard A Allen, William F Guthrie, Brandon Park, Christine E. Murabito, Joaquin (Jack) Martinez
Abstract: The single crystal critical dimension reference materials (SCCDRM) project has been completed, and the samples for the SEMATECH member companies have been released for distribution.  The final technology transfer report is currently undergoing r ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822245

73. Critical Dimension Calibration Standards for ULSI Metrology
Published: 9/30/2003
Authors: Richard A Allen, Michael W Cresswell, Christine E. Murabito, Ronald G Dixson, E. Hal Bogardus
Abstract: NIST and International SEMATECH are developing single-crystal reference materials for use in evaluating and calibrating critical dimension (CD), that is linewidth, metrology tools. Primary calibration of these reference materials uses a high-resoluti ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31314

74. Toward Traceability for At-line AFM Dimensional Metrology
Published: 7/1/2003
Authors: Marylyn H. Bennett, Angela Guerry, Ronald G Dixson, Michael T Postek, Theodore Vincent Vorburger
Abstract: The in-line and at-line measurement tools for critical dimension (CD) metrology in semiconductor manufacturing are technologically advanced instruments that exhibit excellent measurement repeatability - below one nanometer in some cases. Accuracy, ho ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821740

75. Electron Beam Metrology of 193 nm Resists at Ultra Low Voltage
Published: 5/1/2003
Authors: N. Sullivan, Ronald G Dixson, B Bunday, M Mastovich, P Knutruda, P Fabre, R Brandoma
Abstract: Resist slimming under electron beam exposure introduces significant measurement uncertainty in the metrology of 193 nm resists. Total critical dimension (CD) uncertainty of up to 10 nm can arise from line slimming through a combination of the line sl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821976

76. Implementation of a Reference Measurement System Using CD-AFM
Published: 5/1/2003
Authors: Ronald G Dixson, Theodore Vincent Vorburger, Angela Guerry, Marylyn H. Bennett, B Bunday
Abstract: International SEMATECH (ISMT) and the National Institute of Standards and Technology (NIST) are working together to improve the traceability of atomic force microscope (AFM) dimensional metrology in semiconductor manufacturing. The rapid pace of tech ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821967

77. Characterizing CDSEM Metrology of 193 nm Resists at Ultra Low Voltage
Published: 1/1/2002
Authors: N. Sullivan, M Mastovich, Ronald G Dixson, P Knutruda, B Bunday, P Febrea, R Brandoma
Abstract: Resist slimming under electron beam exposure introduces significant measurement uncertainty in the metrology of 193 nm resists.  Total uncertainties, which approach 10 nm, can be realized through the combination of across wafer variation of line ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821957

78. Toward Traceability for At Line AFM Dimensional Metrology
Published: 1/1/2002
Authors: Ronald G Dixson, Angela Guerry, Marylyn H. Bennett, Theodore Vincent Vorburger, Michael T Postek
Abstract: The in-line and at-line measurement tools for critical dimension (CD) metrology in semiconductor manufacturing are technologically advanced instruments that exhibit excellent measurement repeatability--below 1 nm in some cases. Accuracy, however, is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823148

79. Manufacturing of Prostheses
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6791
Published: 9/1/2001
Authors: Matthew A. Davies, Ronald G Dixson
Abstract: This paper is a summary of a workshop session during the Workshop on Biomedical Materials and Devices, held June 13 -14, 2001. The workshop is part of a series of workshops and topical meetings organized by NIST in the area of biomedical technology. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821858

80. Silicon Single Atom Steps as AFM Height Standards
Published: 8/1/2001
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, V W. Tsai, E. C. Williams, Theodore Vincent Vorburger, H Edwards, D Cook, P West, R Nyffenegger
Abstract: Atomic force microscopes (AFMs) are used in the semiconductor industry for a variety of metrology purposes. Step height measurements at the nanometer level and roughness measurements at sub-nanometer levels are often of interest. To perform accurate ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821579