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Author: ravikiran attota

Displaying records 21 to 30 of 37 records.
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21. Optical Through-Focus Technique that Differentiates Small Changes in Line Width, Line Height and Sidewall Angle for CD, Overlay, and Defect Metrology Applications
Published: 4/16/2008
Authors: Ravikiran Attota, Richard M Silver, Bryan M Barnes
Abstract: We present a new optical technique for dimensional analysis of sub 100 nm sized targets by analyzing through-focus images obtained using a conventional bright-field optical microscope.  We present a method to create through-focus image maps (TFIM) us ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824634

22. Optical Critical Dimension Measurement of Silicon Grating Targets Using Back Focal Plane Scatterfield Microscopy
Published: 1/2/2008
Authors: Heather J Patrick, Ravikiran Attota, Bryan M Barnes, Thomas Avery Germer, Michael T. Stocker, Richard M Silver, Michael R Bishop
Abstract: We demonstrate optical critical dimension measurement of lines in silicon grating targets using back focal plane scatterfield microscopy. In this technique, angle-resolved diffraction signatures are obtained from grating targets by imaging the back ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841060

23. Line Width Measurement Technique Using Through-Focus Optical Images
Published: 1/1/2008
Authors: Ravikiran Attota, Richard M Silver, Ronald G Dixson
Abstract: We present a detailed experimental study of a new through-focus technique to measure line width (CD) with nanometer sensitivity using a bright field optical microscope. This method relies on analyzing intensity gradients in optical images at differen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823239

24. Extending the Limits of Image-Based Optical Metrology
Published: 6/20/2007
Authors: Richard M Silver, Bryan M Barnes, Ravikiran Attota, Jay Shi Jun, Michael T. Stocker, Egon Marx, Heather J Patrick
Abstract: We have developed a set of techniques, referred to as scatterfield microscopy, in which the illumination is engineered in combination with appropriately designed metrology targets. Previously we reported results from samples with sub-50 nm sized fea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823218

25. Model-Based Analysis of the Limits of Optical Metrology With Experimental Comparisons
Published: 6/18/2007
Authors: Richard M Silver, Ravikiran Attota, Egon Marx
Abstract: This paper presents a summary and analysis of a study on optical modeling for critical dimension metrology. The paper is focused on two primary elements: 1) the comparison, stability, and validity of multiple electromagnetic scattering models and 2) ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823233

26. Calibrated Overlay Wafer Standard
Series: Special Publication (NIST SP)
Report Number: 260-165
Published: 1/1/2007
Authors: Michael T. Stocker, Richard M Silver, Ravikiran Attota, Jay Shi Jun
Abstract: This document describes the physical characteristics of Standard Reference Material SRM 5000, provides guidance for its use in calibrating overlay (OL) tools, and gives information and precautions concerning its care and handling.Standard Reference M ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823210

27. Fundamental Limits of Optical Critical Dimension Metrology: A Simulation Study
Published: 1/1/2007
Authors: Richard M Silver, Thomas Avery Germer, Ravikiran Attota, Bryan M Barnes, B Bunday, J Allgair, Egon Marx, Jay Shi Jun
Abstract: This paper is a comprehensive summary and analysis of a SEMATECH funded project to study the limits of optical critical dimension scatterometry.  The project was focused on two primary elements: 1) the comparison, stability, and validity of indu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823227

28. Optical Critical Dimension Measurement and Illumination Analysis using the Through-focus Focus Metric
Published: 3/24/2006
Authors: Ravikiran Attota, Richard M Silver, M R Bishop, Ronald G Dixson
Abstract: In this paper we present utility of the out of focus optical microscope images for metrology applications as opposed to the best focus images. Depending on the type of analysis, considerable beneficial information can be deduced from the out of focus ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823215

29. Koehler Illumination for High-Resolution Optical Metrology
Published: 3/1/2006
Authors: Martin Y Sohn, Bryan M Barnes, Lowell P. Howard, Richard M Silver, Ravikiran Attota, Michael T. Stocker
Abstract: Accurate preparation of illumination is critical for high-resolution optical metrology applications such as line width and overlay measurements. To improve the detailed evaluation and alignment of the illumination optics, we have separated Koehler il ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823207

30. The Limits of Image-Based Optical Metrology
Published: 3/1/2006
Authors: Richard M Silver, Bryan M Barnes, Ravikiran Attota, Jay Shi Jun, James J Filliben, Juan Soto, Michael T. Stocker, P Lipscomb, Egon Marx, Heather J Patrick, Ronald G Dixson, Robert D. Larrabee
Abstract: An overview of the challenges encountered in imaging device-sized features using optical techniques recently developed in our laboratories is presented in this paper.  We have developed a set of techniques we refer to as scatterfield microscopy ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823206



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