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You searched on: Author: ravikiran attota

Displaying records 21 to 30 of 42 records.
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21. Nanoparticle size and shape evaluation using the TSOM optical microscopy method
Published: 6/6/2010
Authors: Ravikiran Attota, Richard J Kasica, Lei Chen, Premsagar Purushotham Kavuri, Richard M Silver, Andras Vladar
Abstract: We present a novel optical TSOM (through-focus scanning optical microscopy - pronounced as 'tee-som') method that produces nanoscale dimensional measurement sensitivity using a conventional optical microscope. The TSOM method uses optical information ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905490

22. Nanoscale Measurements With the TSOM Optical Method
Series: OTHER
Published: 1/4/2010
Author: Ravikiran Attota
Abstract: A novel through-focus scanning optical microscope (TSOM - pronounced as 'tee-som') technique that produces nanometer dimensional measurement sensitivity using a conventional optical microscope by analyzing images obtained at different focus positions ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904673

23. Nanoscale Measurements with a Through-Focus Scanning-Optical-Microscope
Published: 7/15/2009
Authors: Ravikiran Attota, Richard M Silver, Thomas Avery Germer
Abstract: We present a novel optical technique that produces nanometer dimensional measurement sensitivity using a conventional optical microscope, by analyzing through-focus scanning-optical-microscope (TSOM) images obtained at different focus positions. In ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902707

24. Through-focus Scanning and Scatterfield Optical Methods for Advanced Overlay Target Analysis
Published: 9/1/2008
Authors: Ravikiran Attota, Michael T. Stocker, Richard M Silver, Nathanael A Heckert, Hui Zhou, Richard J Kasica, Lei Chen, Ronald G Dixson, Ndubuisi George Orji, Bryan M Barnes, Peter Lipscomb
Abstract: In this paper we present overlay measurement techniques that use small overlay targets for advanced semiconductor applications. We employ two different optical methods to measure overlay using modified conventional optical microscope platforms. They ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902294

25. Through-focus scanning optical microscope imaging method for nano-scale dimensional analysis
Published: 9/1/2008
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present a novel optical technique that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope, by analyzing two-dimensional through-focus scanning optical microscope (TSOM) images constructed us ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824668

26. Optical Through-Focus Technique that Differentiates Small Changes in Line Width, Line Height and Sidewall Angle for CD, Overlay, and Defect Metrology Applications
Published: 4/16/2008
Authors: Ravikiran Attota, Richard M Silver, Bryan M Barnes
Abstract: We present a new optical technique for dimensional analysis of sub 100 nm sized targets by analyzing through-focus images obtained using a conventional bright-field optical microscope.  We present a method to create through-focus image maps (TFIM) us ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824634

27. Optical Critical Dimension Measurement of Silicon Grating Targets Using Back Focal Plane Scatterfield Microscopy
Published: 1/2/2008
Authors: Heather J Patrick, Ravikiran Attota, Bryan M Barnes, Thomas Avery Germer, Michael T. Stocker, Richard M Silver, Michael R Bishop
Abstract: We demonstrate optical critical dimension measurement of lines in silicon grating targets using back focal plane scatterfield microscopy. In this technique, angle-resolved diffraction signatures are obtained from grating targets by imaging the back ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841060

28. Line Width Measurement Technique Using Through-Focus Optical Images
Published: 1/1/2008
Authors: Ravikiran Attota, Richard M Silver, Ronald G Dixson
Abstract: We present a detailed experimental study of a new through-focus technique to measure line width (CD) with nanometer sensitivity using a bright field optical microscope. This method relies on analyzing intensity gradients in optical images at differen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823239

29. Extending the Limits of Image-Based Optical Metrology
Published: 6/20/2007
Authors: Richard M Silver, Bryan M Barnes, Ravikiran Attota, Jay Shi Jun, Michael T. Stocker, Egon Marx, Heather J Patrick
Abstract: We have developed a set of techniques, referred to as scatterfield microscopy, in which the illumination is engineered in combination with appropriately designed metrology targets. Previously we reported results from samples with sub-50 nm sized fea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823218

30. Model-Based Analysis of the Limits of Optical Metrology With Experimental Comparisons
Published: 6/18/2007
Authors: Richard M Silver, Ravikiran Attota, Egon Marx
Abstract: This paper presents a summary and analysis of a study on optical modeling for critical dimension metrology. The paper is focused on two primary elements: 1) the comparison, stability, and validity of multiple electromagnetic scattering models and 2) ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823233



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