Nanoscale and Quantum Metrology
Objectives: to advance measurement science at the atomic and nanometer scale, focusing on precision optical metrology, the quantum optics of nanoscale systems, nanoscale devices at the quantum limit, nano-optical systems, condensed matter quantum systems, and quantum materials.
Intended Outcome and Background
This topic area focuses on developing and exploiting precision metrology at the interface between atomic and nanoscale systems. Systems under study include quantum dots and wires, nanomechanical structures, optical microcavities, the quantum optics of nanosystems, metallic nanoparticles, and those with nanoscale features induced on surfaces by highly charged ions. Such systems arise in advanced 193 nm and 157 nm lithography, plasma etching of semiconductor wafers, nanolasers, detectors, biomarkers and sensors, nanomaterials, quantum devices and quantum information.
Our research combines theory and experiment. Theory is used to extend the fundamental understanding of systems at the atomic/nanoscale interface as necessary to interpret experiment, to explore new applications in nanoscale and quantum technologies, and to motivate new and enhanced precision metrology. We are developing the theoretical understanding needed to create nanooptics structures that will be needed in emerging quantum and nanoscale technologies.
The goals of these experiments are to develop new precision measurement tools for this regime, to collect precise data essential for the applications mentioned, and to further the understanding of these systems. We are probing the charge and spin transport, optical, and mechanical properties of nanoscale and quantum-coherent systems. We are developing the precision metrology needed to make accurate optical measurements of individual quantum nanosystems. Ultrahigh precision measurements of the linear and nonlinear optical response of fluids and lens materials needed for next generation optical lithography have been developed and carried out. Such measurements are critically needed by the semiconductor industry to develop immersion lithography for sub-100 nm optical nanolithography.
Highlights and Accomplishments