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Publication Citation: Traceable Calibration of a Critical Dimension Atomic Force Microscope

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Author(s): Ronald G. Dixson; Ndubuisi G. Orji; Craig D. McGray; Jon C. Geist;
Title: Traceable Calibration of a Critical Dimension Atomic Force Microscope
Published: June 06, 2011
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this effort is a custom in-house metrology AFM, called the calibrated AFM (C-AFM). The NIST C-AFM has displacement metrology for all three axes traceable to the 633 nm wavelength of the iodine-stabilized He-Ne laser. A second major component of this program is the use of critical dimension atomic force microscopy (CD-AFM). CD-AFM is a commercially available AFM technology that uses flared tips and two-dimensional surface sensing to scan the sidewalls of near-vertical features. Features of this sort that are commonly encountered in semiconductor manufacturing and other nanotechnology industries. NIST has experience in the calibration and characterization of CD-AFM instruments and in the development of uncertainty budgets for typical measurands in semiconductor manufacturing metrology. A third generation CD-AFM was recently installed at NIST. The current performance of this instrument for pitch and height measurements appears to support our relative expanded uncertainty goals in the range of 1.0  10-3 down to 1.0  10-4.
Conference: Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences
Proceedings: Proceedings of SPIE, Vol. 8036
Volume: 8036
Pages: 10 pp.
Location: Orlando, FL
Dates: April 26-28, 2011
Keywords: CD-AFM; metrology; CD; linewidth; reference measurement system; standards; calibration; traceability
Research Areas: Nanomanufacturing, Length