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NIST Authors in Bold
|Author(s):||Xuelei X. Liang; Brent A. Sperling; Irene G. Calizo; Guangjun Cheng; Christina A. Hacker; Qin Q. Zhang; Yaw S. Obeng; Kai Yan; Hailin Peng; Qiliang Li; Xiaoxiao Zhu; Hui Yuan; Angela R. Hight Walker; Zhongfan Liu; Lianmao Peng; Curt A. Richter;|
|Title:||Towards clean and crackless transfer of graphene|
|Published:||January 02, 2012|
|Abstract:||We present the results of a thorough study of wet chemical methods for transferring chemical vapor deposition grown graphene from the metal growth substrate to a device compatible substrate. Based on these results, we have developed a ,modified RCA cleanŠ transfer method which has much better control of both contamination and crack formation and does not degrade the quality of the transferred graphene. Using this transfer method, high device yields, up to 97%, with a narrow device performance metrics distribution were achieved. This demonstration addresses an important step towards large scale graphene-based electronic device applications.|
|Pages:||pp. 9144 - 9153|
|Keywords:||nanoelectronics, graphene, graphene transfer, cleaning, crackless, semiconductor device|
|Research Areas:||Nanoelectronics and Nanoscale Electronics|
|PDF version:||Click here to retrieve PDF version of paper (5MB)|