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|Author(s):||Ronnie R. Fesperman Jr.; M A. Donmez; Shawn P. Moylan;|
|Title:||Ultra-Precision Linear Motion Metrology|
|Published:||June 23, 2010|
|Abstract:||Many new emerging applications of nanotechnologies require the use of compact precision linear translation stages that have positioning resolution on the order of a nanometer and an exceptionally long range of motion on the order of tens of millimeters. Such devices are expected to perform with sub-micrometer positioning accuracy and repeatability. Manufacturers and consumers of such systems have begun to recognize the difficulties in certifying the performance of these systems with appropriate levels of measurement uncertainty. Sources of measurement uncertainty that were once considered insignificant when measuring in the micrometer regime are now becoming very significant while measuring in the nanometer regime. This paper describes the work being performed to investigate and evaluate the use of interferometry for measuring and determining the accuracy and repeatability of positioning numerically controlled axes with levels of uncertainty of a few nanometers or better.|
|Proceedings:||ASPE 2010 Summer Topical Meeting on Precision Interferometric Metrology|
|Pages:||pp. 103 - 108|
|Dates:||June 23-25, 2010|
|Keywords:||Displacement Measuring Interferometry,Uncertainty,Position Accuracy and Repeatability|
|Research Areas:||Metrology and Standards for Manufacturing Equipment|
|PDF version:||Click here to retrieve PDF version of paper (2MB)|