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|Author(s):||K Efimenko; Ali Ozcam; Jan Genzer; Daniel A. Fischer; Frederick R. Phelan Jr.; Jack F. Douglas;|
|Title:||Colliding Self-Assembly Waves in Organosilane Monolayers|
|Abstract:||Colliding autocatalytic wave-fronts of organosilane (OS) layer self-assembly are generated through the controlled positioning of sources of the volatile OS material at the edges of a silica wafer and through adjustment of the container dimensions in which the wafer-source system is placed. The concentration profiles and molecular orientation of the OSs of colliding wave-fronts are assessed by means of combinatorial near-edge x-ray absorption fine structure (NEXAFS) spectroscopy. For systems involving waves made of the same OS precursor (homogeneous systems), the shapes and positions of both fronts on the surface are centro-symmetrical. In contrast, heterogeneous systems, involving OSs having different chemistries and head-groups, exhibit highly non-symmetrical concentration profiles on the substrate. We discuss effects relevant to understanding these wave-front collision phenomena.|
|Citation:||Soft Matter Gradient Surfaces: Methods & Applications|
|Publisher:||Wiley, New York, NY|
|Keywords:||fluctuation-induced interfacial broadening, frontal self-assembly, mean-field Fisher Kolmogorov equation, reaction diffusion fronts, self-assembled monolayers|
|Research Areas:||Nanofabrication, Nanomanufacturing, and Nanoprocessing|