| Author(s): |
K Efimenko; Ali Ozcam; Jan Genzer; Daniel A. Fischer; Frederick R. Phelan Jr; Jack F. Douglas; |
| Title: |
Colliding Self-Assembly Waves in Organosilane Monolayers |
| Published: |
Date Unknown |
| Abstract: |
Colliding autocatalytic wave-fronts of organosilane (OS) layer self-assembly are generated through the controlled positioning of sources of the volatile OS material at the edges of a silica wafer and through adjustment of the container dimensions in which the wafer-source system is placed. The concentration profiles and molecular orientation of the OSs of colliding wave-fronts are assessed by means of combinatorial near-edge x-ray absorption fine structure (NEXAFS) spectroscopy. For systems involving waves made of the same OS precursor (homogeneous systems), the shapes and positions of both fronts on the surface are centro-symmetrical. In contrast, heterogeneous systems, involving OSs having different chemistries and head-groups, exhibit highly non-symmetrical concentration profiles on the substrate. We discuss effects relevant to understanding these wave-front collision phenomena. |
| Citation: |
Soft Matter Gradient Surfaces: Methods & Applications |
| Publisher: |
Wiley, New York, NY |
| Keywords: |
fluctuation-induced interfacial broadening; frontal self-assembly; mean-field Fisher Kolmogorov equation; reaction diffusion fronts; self-assembled monolayers |
| Research Areas: |
Nanofabrication, Nanomanufacturing, and Nanoprocessing |
