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Publication Citation: Application of Thermal Gradients to Achieve Orientational Order in Block Copolymer Thin Films

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Author(s): Nathaniel J. Fredin; Brian Berry; Kevin G. Yager; Alamgir Karim; Sushil K. Satija; Deanna Pickel; Ronald L. Jones;
Title: Application of Thermal Gradients to Achieve Orientational Order in Block Copolymer Thin Films
Published: August 18, 2009
Abstract: The development of methods that permit control over the long-range order and orientation of microdomains in block copolymer (BCP) thin films for bottom-up approaches to nanoscale surface patterning is of great interest for many applications, including microelectronics and data storage devices. One such method recently reported is a type of zone refinement called cold zone annealing (CZA), in which the BCP film is passed across a thermal gradient, was shown to result in long-range orientational order. CZA is a versatile technique that can be combined with other approaches, such as chemical or topographic substrate patterning. Here, we utilize a combination of Rotational Small Angle Neutron Scattering (R-SANS) and specular neutron reflectivity (SNR) to investigate the mechanism and driving forces behind CZA. These unique techniques are used to characterize the 3-dimensional structural properties of zone annealed BCP films, revealing the previously unreported role of thermal gradients in controlling the kinetics and orientation of block copolymer films.
Conference: 238th ACS National Meeting & Exposition, Fall 2009
Proceedings: 238th ACS National Meeting & Exposition, Fall 2009, Division of Polymer Materials: Science & Engineering
Volume: 101
Pages: pp. 791 - 791
Location: Washington, DC
Dates: August 16-20, 2009
Keywords: block copolymer lithography, polymer thin films, neutron scattering, data storage, microelectronics, nanotechnology
Research Areas: Block copolymer lithography, Directed self-assembly, Nanomaterials, Materials Chemistry and Crystallography
PDF version: PDF Document Click here to retrieve PDF version of paper (613KB)