| Author(s): |
Nathaniel J. Fredin; Brian Berry; Kevin G. Yager; Alamgir Karim; Sushil K. Satija; Deanna Pickel; Ronald L. Jones; |
| Title: |
Application of Thermal Gradients to Achieve Orientational Order in Block Copolymer Thin Films |
| Published: |
August 18, 2009 |
| Abstract: |
The development of methods that permit control over the long-range order and orientation of microdomains in block copolymer (BCP) thin films for bottom-up approaches to nanoscale surface patterning is of great interest for many applications, including microelectronics and data storage devices. One such method recently reported is a type of zone refinement called cold zone annealing (CZA), in which the BCP film is passed across a thermal gradient, was shown to result in long-range orientational order. CZA is a versatile technique that can be combined with other approaches, such as chemical or topographic substrate patterning. Here, we utilize a combination of Rotational Small Angle Neutron Scattering (R-SANS) and specular neutron reflectivity (SNR) to investigate the mechanism and driving forces behind CZA. These unique techniques are used to characterize the 3-dimensional structural properties of zone annealed BCP films, revealing the previously unreported role of thermal gradients in controlling the kinetics and orientation of block copolymer films. |
| Conference: |
238th ACS National Meeting & Exposition, Fall 2009 |
| Proceedings: |
238th ACS National Meeting & Exposition, Fall 2009, Division of Polymer Materials: Science & Engineering
|
| Volume: |
101 |
| Pages: |
pp. 791 - 791 |
| Location: |
Washington, DC |
| Dates: |
August 16-20, 2009 |
| Keywords: |
block copolymer lithography; polymer thin films; neutron scattering; data storage; microelectronics; nanotechnology |
| Research Areas: |
Block copolymer lithography, Directed self-assembly, Nanomaterials, Materials Chemistry and Crystallography |
| PDF version: |
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