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|Author(s):||Nathaniel J. Fredin; Brian Berry; Kevin G. Yager; Alamgir Karim; Sushil K. Satija; Deanna Pickel; Ronald L. Jones;|
|Title:||Application of Thermal Gradients to Achieve Orientational Order in Block Copolymer Thin Films|
|Published:||August 18, 2009|
|Abstract:||The development of methods that permit control over the long-range order and orientation of microdomains in block copolymer (BCP) thin films for bottom-up approaches to nanoscale surface patterning is of great interest for many applications, including microelectronics and data storage devices. One such method recently reported is a type of zone refinement called cold zone annealing (CZA), in which the BCP film is passed across a thermal gradient, was shown to result in long-range orientational order. CZA is a versatile technique that can be combined with other approaches, such as chemical or topographic substrate patterning. Here, we utilize a combination of Rotational Small Angle Neutron Scattering (R-SANS) and specular neutron reflectivity (SNR) to investigate the mechanism and driving forces behind CZA. These unique techniques are used to characterize the 3-dimensional structural properties of zone annealed BCP films, revealing the previously unreported role of thermal gradients in controlling the kinetics and orientation of block copolymer films.|
|Conference:||238th ACS National Meeting & Exposition, Fall 2009|
|Proceedings:||238th ACS National Meeting & Exposition, Fall 2009, Division of Polymer Materials: Science & Engineering|
|Pages:||pp. 791 - 791|
|Dates:||August 16-20, 2009|
|Keywords:||block copolymer lithography, polymer thin films, neutron scattering, data storage, microelectronics, nanotechnology|
|Research Areas:||Nanomaterials, Directed self-assembly, Block copolymer lithography, Materials Chemistry and Crystallography|
|PDF version:||Click here to retrieve PDF version of paper (613KB)|