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|Author(s):||Richard M. Silver;|
|Title:||Scatterfield Optical Imaging for sub-10 nm Dimensional Metrology|
|Published:||January 01, 2009|
|Abstract:||Recent developments in optical microscopy promise to advance optical metrology and imaging to unprecedented levels through theoretical and experimental development of a new measurement technique called "scatterfield optical imaging". ". Current metrology requirements are demanding higher throughput measurements with nanometer sensitivity to enable tighter process control as well as closed-loop integrated process control. This new technique makes possible high throughput measurements of nanometer-sized features using low cost optical methods with the potential for substantial impact on manufacturing productivity and process control as well as providing the measurement basis for new calibration standards well beyond the state-of-the-art.|
|Citation:||Laser Focus World|
|Keywords:||optical microscopy, optical metrology and imaging, "scatterfield optical imaging", nanometer sensitivity, high throughput measurements, low cost optical methods|
|Research Areas:||Metrology, Optical Physics, Manufacturing|