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|Author(s):||Hyun Wook Ro; K Char; Eun-Chae Jeon; H C. Kim; Dongil Kwon; Hae-Jeong Lee; J. H. Lee; Hee-Woo Rhee; Christopher L. Soles; Do Y. Yoon;|
|Title:||Mechanically Robust Spin-On Organosilicates Glasses for Nanoporous Applications|
|Published:||February 07, 2007|
|Abstract:||An increasing number of technologies demand nanoporous materials with vastly improved physical, mechanical and thermal properties. This manuscript develops the microstructural basis for synthesizing organosilicate glasses (OSGs) with unprecedented thermal, mechanical, and physical properties. OSGs are traditionally synthesized by cross-linking alkyltrifunctionalsilanes (SiOxRH where R is an organic group) into a rigid glass. The critical insight is to bias this reaction to form small cyclic and cage type silsesquioxane precursors that remain soluble in the reaction solution and can later be covalently incorporated into the final cross-linked network.This is accomplished by copolymerizing methyltrimethoxysilane with an ethylene-bridged pair of trimethoxysilanes, leading to an unparalleled 6-fold increase in elastic modulus, a 4-fold increase in hardness, and 20-fold decrease of the thermal expansion coefficient. These vastly superior mechanical and thermal properties are discussed in the context of next generation semiconductor devices.|
|Pages:||pp. 705 - 710|
|Keywords:||hardness,low-k dielectric,modulus,nanoindentation,organosilicate,porosity,thin film,x-ray porosimetry|
|Research Areas:||Polymers, Semiconductor Materials, Materials Science, Advanced Materials|
|PDF version:||Click here to retrieve PDF version of paper (326KB)|