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Publication Citation: Nanometrology - FY 2003 Program and Selected Accomplishments

NIST Authors in Bold

Author(s): C M. Allocca; Stephen W. Freiman;
Title: Nanometrology - FY 2003 Program and Selected Accomplishments
Published: December 15, 2003
Abstract: The emphasis on nanotechnology around the world is leading to the development and commercialization of unique products based upon significantly smaller devices and material ensembles. Materials at the nanoscale in three dimensions (NEMS, MEMS), two dimensions (ultrathin films) and one dimension (carbon nanotubes) are growing in importance. Within the next few years novel devices at the micro- and nanoscale are expected to play key roles in a spectrum of industry sectors, including manufacturing, information technology, electronics, and healthcare. Nanometrology, i.e., the measurement of dimensions, characterization of materials and elucidation of structures of new and novel materials at the nanoscale, will be critical to the commercial development of this exciting new field.The objective of the MSEL Nanotechnology Program is the development of metrology at the nanoscale for bulk and surface material properties as well as process monitoring. The Program encompasses metals, ceramics, and polymers in various forms particles, thin films, nanotubes, and self-assembled structures. The Program is divided into five categories: Nanomechanics, Nanocharacterization, Nanoelectronics, Nanomagnetics, and Nanomanufacturing. This report contains short descriptions of selected accomplishments in these five areas.
Citation: NIST Interagency/Internal Report (NISTIR) -
Pages: 90 pp.
Keywords: materials science,nanometrology,nanotechnology
Research Areas: Materials Science, Nanotechnology