Parametric Uncertainty in Optical Image Modeling

Published

September 18, 2006

Author(s)

James E. Potzick, Egon Marx, M P. Davidson

Abstract

Optical photomask feature metrology and wafer exposure process simulation both rely on optical image modeling for accurate results. While it is fair to question the accuracies of the available models, model results also depend on several input parameters describing the object and imaging system. Errors in these parameter values can lead to significant errors in the modeled image. These parameters include wavelength, illumination and objective NA?s, magnification, focus, etc. for the optical system, and topography, complex index of refraction n and k, etc. for the object. In this paper each input parameter is varied over a range about its nominal value and the corresponding images simulated. Second order parameter interactions are not explored. Using the scenario of the optical measurement of photomask features, these parametric sensitivities are quantified by calculating the apparent change of the measured linewidth for a small change in the relevant parameter. Then, using reasonable values for the estimated uncertainties of these parameters, the parametric linewidth uncertainties can be calculated and combined to give a lower limit to the linewidth measurement uncertainty for those parameter uncertainties.

Proceedings Title

Proceedings of SPIE

Volume

6349

Conference Dates

September 18, 2006

Conference Location

Monterey, CA

Conference Title

Photomask Technology (BACUS) 2006

Pub Type

Conferences

Keywords

feature size., measurement uncertainty, Optical image modeling, photomask

Citation

Potzick, J. , Marx, E. and Davidson, M. (2006), Parametric Uncertainty in Optical Image Modeling, Proceedings of SPIE, Monterey, CA (Accessed October 16, 2025)