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Publication Citation: Images of Strips On and Trenches In Substrates

NIST Authors in Bold

Author(s): Egon Marx;
Title: Images of Strips On and Trenches In Substrates
Published: January 01, 2007
Abstract: The computation of images of lines or strips on a substrate and trenches in a substrate or a layer above a substrate, all made of dielectric or absorbing materials, using integral equations equivalent to Maxwell's equations and using Fourier optics are explained in some detail.  Examples of computed images illustrating some of the features found in the images are provided.  Approximations involved in the model of the actual scatterer and microscope as well as the theoretical and numerical representations are discussed.
Citation: Applied Optics
Volume: 46
Pages: pp. 5571 - 5587
Keywords: electromagnetic scattering,overlay,photomask,singular integral equations,two-dimensional Maxwell equations
Research Areas: Metrology, Manufacturing