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Publication Citation: Advanced Optics Characterization

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Author(s): Angela Davies; Charles S. Tarrio; Christopher J. Evans;
Title: Advanced Optics Characterization
Published: February 01, 2001
Abstract: Science, commerce, and defense continuously drive the optical community to provide less expensive, more perfect products. High performance optical systems always demand tighter tolerances-and tighter tolerances drive the need for ever better metrology. Aspheric optics, shorter wavelengths and resonant systems enable high performance, and make the metrologist''s life more difficult. Two of the recent drivers of tighter optical tolerances have been Extreme Ultra Violet Lithography (EUVL) and the Laser Interferometric Gravitational-wave Observatory (LIGO).
Citation: Optics and Photonics News
Volume: 12
Issue: No. 2
Pages: pp. 34 - 37
Keywords: extreme ultraviolet;interferometry;lithography;metrology;reflectometry
Research Areas: Dimensional Metrology