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PUBLICATIONS

Advanced Optics Characterization

Published

Author(s)

Angela Davies, Charles S. Tarrio, Christopher J. Evans

Abstract

Science, commerce, and defense continuously drive the optical community to provide less expensive, more perfect products. High performance optical systems always demand tighter tolerances-and tighter tolerances drive the need for ever better metrology. Aspheric optics, shorter wavelengths and resonant systems enable high performance, and make the metrologist''s life more difficult. Two of the recent drivers of tighter optical tolerances have been Extreme Ultra Violet Lithography (EUVL) and the Laser Interferometric Gravitational-wave Observatory (LIGO).
Citation
Optics and Photonics News
Volume
12
Issue
No. 2
Pub Type
Others

Keywords

extreme ultraviolet, interferometry, lithography, metrology, reflectometry
Dimensional metrology

Citation

Davies, A. , Tarrio, C. and Evans, C. (2001), Advanced Optics Characterization, Optics and Photonics News (Accessed October 19, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created February 1, 2001, Updated February 19, 2017
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