| Author(s): |
John A. Kramar; Jay S. Jun; William B. Penzes; Vincent P. Scheuerman; Fredric Scire; E C. Teague; |
| Title: |
Molecular Measuring Machine Design and Performance |
| Published: |
January 01, 2001 |
| Abstract: |
We have developed a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing two-dimensional point-to-point measurements with nanometer-level uncertainties over a 50 mm by 50 mm area. The scanning tunneling microscope probe and the Michelson interferometer metric both have sub-nanometer resolution. M3 operates in a vacuum of 10<sup>-5</sup> Pa and at a temperature of 20 ? 0.005?C. We have measured the pitch of a one-dimensional grating produced by laser-focused atomic deposition of Cr. The average line pitch was 212.69 nm, with an estimated standard uncertainty of 5 pm, compared with a predicted value of 212.78 ? 0.01 nm. Measurements were also made of the surface lattice parameters of the organic conductor (TEET)[Ni(dmit)2]2. Initial small-area measurements were in agreement with the x-ray-crystallography-measured lattice constants of 1.02 nm and 0.75 nm to within 70 pm. |
| Conference: |
American Society for Precision Engineering |
| Proceedings: |
Proceedings of the American Society for Precision Engineering |
| Volume: |
25 |
| Pages: |
pp. 19 - 22 |
| Location: |
Arlington, VA |
| Dates: |
November 1, 2001 |
| Keywords: |
atom-based standards;dimensional metrology;Michelson interferometry;scanning tunneling microscopy |
| Research Areas: |
Metrology, Manufacturing |
