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Publication Citation: Molecular Measuring Machine Design and Performance

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Author(s): John A. Kramar; Jay S. Jun; William B. Penzes; Vincent P. Scheuerman; Fredric Scire; E C. Teague;
Title: Molecular Measuring Machine Design and Performance
Published: January 01, 2001
Abstract: We have developed a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing two-dimensional point-to-point measurements with nanometer-level uncertainties over a 50 mm by 50 mm area. The scanning tunneling microscope probe and the Michelson interferometer metric both have sub-nanometer resolution. M3 operates in a vacuum of 10<sup>-5</sup> Pa and at a temperature of 20 ? 0.005?C. We have measured the pitch of a one-dimensional grating produced by laser-focused atomic deposition of Cr. The average line pitch was 212.69 nm, with an estimated standard uncertainty of 5 pm, compared with a predicted value of 212.78 ? 0.01 nm. Measurements were also made of the surface lattice parameters of the organic conductor (TEET)[Ni(dmit)2]2. Initial small-area measurements were in agreement with the x-ray-crystallography-measured lattice constants of 1.02 nm and 0.75 nm to within 70 pm.
Conference: American Society for Precision Engineering
Proceedings: Proceedings of the American Society for Precision Engineering
Volume: 25
Pages: pp. 19 - 22
Location: Arlington, VA
Dates: November 1, 2001
Keywords: atom-based standards;dimensional metrology;Michelson interferometry;scanning tunneling microscopy
Research Areas: Metrology, Manufacturing