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|Author(s):||Michael T. Postek; H Ho; L Harrison;|
|Title:||Dimensional Metrology at the Nanometer Level: Combined SEM and PPM|
|Published:||July 01, 1997|
|Abstract:||The National Institute of Standards and Technology (NIST) is currently exploring the potentials afforded by the incorporation of a commercial proximal probe microscope (PPM) operating in the scanning tunneling or atomic force mode into a high resolution field emission scanning electron microscope (SEM). This instrument will be used in the development of NIST traceable standards for dimensional metrology at the nanometer level. The combination of the two microscopic techniques provides: high precision probe placement, the capability of measuring and monitoring the probe geometry. monitoring the scanning of the probe across the feature of interest and an ability for comparative microscopy. The integration of the commercial instrument is the first step in the development of a custom NIST integrated SEM/SxM metrology instrument (with the x variable depending upon the type of probe being used). This paper presents early results regarding the integration of the two instruments and the application of these instruments to the development of SRM 2090 and the SEM sharpness standard.|
|Conference:||Scanning Probe Metrology II|
|Proceedings:||Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XI, Susan K. Jones, Editor|
|Pages:||pp. 250 - 263|
|Location:||Santa Clara, CA|
|Dates:||March 10, 1997|
|Keywords:||atomic force microscope,metrology,proximal probe microscopy,resolution,scanning electron microscope,Standard Reference Materials,standards|
|Research Areas:||Metrology, Manufacturing|