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NIST Authors in Bold
|Author(s):||James E. Potzick; J Nunn;|
|Title:||International Comparison of Photomask Linewidth Standards: U.S. (NIST) and U.K. (NPL)|
|Published:||May 01, 1996|
|Abstract:||Photomask linewidth standards serve as primary standards for the calibration of photomask metrology tools and are available from the national standards organizations of several countries. These standards are often in the form of chrome-on-quartz photomasks with a variety of linewidth, spacewidth, and pitch patterns. The British and U.S. national laboratories have made comparative measurements of linewidth, spacewidth, and pitch on two national photomask linewidth standards in order to detect any systematic differences between their respective calibration systems. The measurement differences were all found to be within the calibration expanded uncertainties of both laboratories combined, and are not significant at the 95% confidence level.|
|Conference:||Standards and Calibration Methods for Critical Dimension Metrology|
|Proceedings:||Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography X, Susan K. Jones, Editor|
|Pages:||pp. 124 - 129|
|Location:||Santa Clara, CA|
|Dates:||March 11, 1996|
|Keywords:||accuracy,calibration,critical dimension,international standard,linewidth,measurement standard,photomask,pitch|
|Research Areas:||Manufacturing, Metrology|