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|Author(s):||Michael T. Postek;|
|Title:||Scanning Electron Microscope Metrology|
|Published:||January 01, 1994|
|Abstract:||During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of precision. Optical microscopy, scanning electron microscopy and the various forms of scanning probe microscopies are major microscopical techniques used for submicrometer metrology. New techniques applied to scanning electron microscopy have improved some of the limitations of this technique and time will permit even further improvements. This presentation will review the current state of scanning electron microscopes (SEM) metrology in light of many of these recent improvements.|
|Conference:||Critical Reviews of Optical Science and Technology|
|Proceedings:||Proceedings of SPIE|
|Pages:||pp. 46 - 91|
|Dates:||September 28-29, 1993|
|Research Areas:||Manufacturing, Metrology|