Laser-Focused Nanofabrication: Beating of Two Atomic Resonances

Published

June 10, 2002

Author(s)

E Jurdik, K van, J Hohlfeld, T Rasing, Jabez J. McClelland

Abstract

We deposit a laser-collimated chromium beam onto a substrate through a laser standing-wave (SW) tuned above the atomic resonance at either of the two ⁵²Cr transitions ⁷S₃rarr}⁷P°₃ at 427.600 nm or ⁷S₃rarr}⁷P°₄ at 425.553 nm. In both these cases the resulting pattern on the surface consists of nanolines with a period of that of the SW. We extend the range of periods accessible to laser-focused atom deposition by superimposing the structures grown at both these resonances. The resulting beating pattern exhibits a period of 44.46 plus or minus}0.04 υm as determined with a polarizing optical microscope. This structure provides a link between nanoscopic and macroscopic worlds and could potentially become a calibration standard for length metrology.

Citation

Applied Physics Letters

Volume

80

Issue

23

Pub Type

Journals

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Keywords

atom lithography, atom optics, chromium, interference, laser focused atomic deposition, nanoscale metrology

Citation

Jurdik, E. , Van, K. , Hohlfeld, J. , Rasing, T. and McClelland, J. (2002), Laser-Focused Nanofabrication: Beating of Two Atomic Resonances, Applied Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=620543 (Accessed October 21, 2025)