Laser-Focused Nanofabrication: Beating of Two Atomic Resonances

Published

June 10, 2002

Author(s)

E Jurdik, K van, J Hohlfeld, T Rasing, Jabez J. McClelland

Abstract

We deposit a laser-collimated chromium beam onto a substrate through a laser standing-wave (SW) tuned above the atomic resonance at either of the two ⁵²Cr transitions ⁷S₃rarr}⁷P°₃ at 427.600 nm or ⁷S₃rarr}⁷P°₄ at 425.553 nm. In both these cases the resulting pattern on the surface consists of nanolines with a period of that of the SW. We extend the range of periods accessible to laser-focused atom deposition by superimposing the structures grown at both these resonances. The resulting beating pattern exhibits a period of 44.46 plus or minus}0.04 υm as determined with a polarizing optical microscope. This structure provides a link between nanoscopic and macroscopic worlds and could potentially become a calibration standard for length metrology.

Citation

Applied Physics Letters

Volume

80

Issue

23

Pub Type

Journals

Download Paper

Local Download

Keywords

atom lithography, atom optics, chromium, interference, laser focused atomic deposition, nanoscale metrology

Citation

Jurdik, E. , Van, K. , Hohlfeld, J. , Rasing, T. and McClelland, J. (2002), Laser-Focused Nanofabrication: Beating of Two Atomic Resonances, Applied Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=620543 (Accessed October 13, 2025)