Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).

View the beta site
NIST logo

Publication Citation: Comparison of the Identities, Fluxes, and Energies of Ions Formed in High Density Fluorocarbon Discharges

NIST Authors in Bold

Author(s): Amanda N. Goyettes; Yicheng Wang; James K. Olthoff;
Title: Comparison of the Identities, Fluxes, and Energies of Ions Formed in High Density Fluorocarbon Discharges
Published: January 01, 2001
Abstract: Positive ion bombardment plays an essential role in plasma processing, influencing etch rates, materials selectivity and etching profiles. Experimental determination of ion identities and energies in processing plasmas provides complementary data necessary to validate the accuracy of plasma models, and contributes to a fundamental understanding of the underlying discharge physics and chemistry. We present a comparative summary of ion compositions and energy distributions in inductively coupled discharges sustained in six fluorinated compounds: CF4, CHF3, C2F6, c-C4F8, CF3I and CF3CH2F. Mass-resolved ion fluxes and energies are measured using a combined energy analyzer-mass spectrometer that samples ions extracted through an orifice in the lower electrode of an inductively coupled Gaseous Electronics Conference (GEC) rf reference cell. These compounds represent common plasma processing gases as well as two gases with significantly lower global warming potentials, CF3I and CF3CH2F. We compare the identities of the significant ions formed, the relative yields of CFx+ and secondary ions, the width and structure of the ion energy distributions, and the mean ion energies in these six plasma chemistries. The general effects of plasma operating conditions and Ar dilution on these properties are summarized.
Proceedings: Proc. of Characterization and Metrology for ULSI Technology 2000 Intl. Conf.
Pages: pp. 283 - 242
Location: Gaithersburg, MD
Dates: June 26-29, 2000
Keywords: GEC reference cell,inductively-coupled discharge,ion energy distribution,ion flux
Research Areas: Electronics & Telecommunications
PDF version: PDF Document Click here to retrieve PDF version of paper (3MB)