| Author(s): |
John M. Moreland; Albrecht Jander; James A. Beall; Pavel Kabos; Stephen E. Russek; |
| Title: |
Micromechanical Torque Magnetometer for In Situ Thin-film Measurements |
| Published: |
July 01, 2001 |
| Abstract: |
We describe a new type of magnetometer based on a microelectromechanical system (MEMS) for in situ monitoring of magnetic film moment during the film deposition process. The magnetometer measured mechanical torque on a film as it is deposited onto a microscopic flexible silicon cantilever. The cantilever is excited by an external ac magnetic filed and its angular displacement is proportional to the magnetic moment of the film. The instrument has a magnetic moment sensitivity of 1 × 10 -12 Am2/√Hz corresponding to a torque sensitivity of 4 × 10 -16 Nm/√Hz. We were able to detect the moments of Fe films as thin as 3 nm. For thicker films (above 9 nm) we can detect thickness changes as small as 0.3 nm, corresponding to the instrument's moment sensitivity limit. |
| Citation: |
IEEE Transactions on Magnetics |
| Volume: |
37 |
| Issue: |
4 |
| Pages: |
pp. 2770 - 2772 |
| Keywords: |
atomic force microscope (AFM);micro-cantilever;microelectromechanical systems (MEMS);torque magnetometer; |
| Research Areas: |
Electromagnetics |
| PDF version: |
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