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|Author(s):||John M. Moreland; Albrecht Jander; James A. Beall; Pavel Kabos; Stephen E. Russek;|
|Title:||Micromechanical Torque Magnetometer for In Situ Thin-film Measurements|
|Published:||July 01, 2001|
|Abstract:||We describe a new type of magnetometer based on a microelectromechanical system (MEMS) for in situ monitoring of magnetic film moment during the film deposition process. The magnetometer measured mechanical torque on a film as it is deposited onto a microscopic flexible silicon cantilever. The cantilever is excited by an external ac magnetic filed and its angular displacement is proportional to the magnetic moment of the film. The instrument has a magnetic moment sensitivity of 1 × 10 -12 Am2/√Hz corresponding to a torque sensitivity of 4 × 10 -16 Nm/√Hz. We were able to detect the moments of Fe films as thin as 3 nm. For thicker films (above 9 nm) we can detect thickness changes as small as 0.3 nm, corresponding to the instrument's moment sensitivity limit.|
|Citation:||IEEE Transactions on Magnetics|
|Pages:||pp. 2770 - 2772|
|Keywords:||atomic force microscope (AFM),micro-cantilever,microelectromechanical systems (MEMS),torque magnetometer|
|PDF version:||Click here to retrieve PDF version of paper (56KB)|