The NIST Center for Nanoscale Science and Technology (CNST) supports the U.S. nanotechnology enterprise from discovery to production by providing industry, academia, NIST, and other government agencies with access to world-class nanoscale measurement and fabrication methods and technology. As part of the CNST, the shared-use NanoFab gives researchers economical access to and training on a state-of-the-art tool set for cutting-edge nanotechnology development. The simple application process is designed to get researchers into the facility in a few weeks.
Looking beyond the current commercial state of the art, the CNST's NanoLab offers opportunities for researchers to collaborate on creating and using the next generation of nanoscale measurement instruments and methods. more...
CNST NanoFab Opens Soft Lithography Lab
The CNST NanoFab has established a new soft lithography laboratory. This lab provides researchers with rapid access to tools and processes for fabricating devices in soft materials, with applications ranging from microfluidics and nanofluidics, to flexible electronics and optics, to devices with patterned surface chemistries.
Located in Building 216, room F102, the 25 m2 lab is equipped with a casting station for polydimethylsiloxane (PDMS) coating, a plasma bonder for surface preparation, a convection oven for PDMS baking, and a laminar clean hood for final assembly. The casting station is housed in a fume hood, which also includes a spin coater, a scale, a hot plate, and a desiccator for PDMS mixing, degassing, coating, and baking. The casting station and oven support substrates ranging from 150 mm diameter wafers down to small pieces and the plasma cleaner supports wafers as large as 75 mm in diameter. Over the next 15 months, the CNST NanoFab plans to double the soft lithography lab space to 50 m2 and add tools to improve process reliability and repeatability. The new tools will include a silane vapor deposition tool, a PDMS mixing tool, and a PDMS punch.
To arrange lab access and training, or for more information, please contact Robert Newby, 301-975-6070.
Sputter Cluster System Now Available
A new 4-Wave IBD/BTD cluster sputter deposition system has been installed in the clean room and is now available to users. This tool will provide users physical deposition capability using the ion beam deposition or biased target deposition techniques resulting in the densest available thin films deposited at room temperature. The system has cassette-to-cassette and robot wafer handling, a load lock, and 12 ready-to-deposit materials to provide users clean films deposited on substrates ranging from small pieces up to 200 mm diameter wafers. more...
For more information, contact Gerard Henein, 301-975-5645.
Direct Write E-Beam Lithography System Now Available
A new JEOL 6300-FS direct write electron beam lithography system has been installed in the clean room, doubling the NanoFab’s capability in e-beam lithography. The new state-of-the-art system offers high resolution exposure capability and accommodates batch handling of substrates. The system is available to users through the NEMO system. more...
For more information, contact Rich Kasica, 301-975-2693.
New Sheet Resistance Mapping Tool Now Available
The CNST has purchased a Four Dimensions 280DI 4-point probe sheet resistance mapping system which is now available to users in the NanoFab cleanroom. The tool will use the four point probe technique to measure sheet resistances ranging from 800 GΩ down to 1 mΩ. The automated stage and software provide mapping measurement capability of up to 5000 points per wafer on substrates ranging from 200 mm diameter wafers down to 25 mm diameter wafers with a measurement speed of a few seconds per point. more...
For additional information, contact Gerard Henein, 301-975-5645, firstname.lastname@example.org.
New Lithography Coater System Now Available
A new Suss Microtec ASC200 Gen 3 automated resist coater has been installed in the NanoFab cleanroom. This system is able to perform spray and spin resist coating with automated wafer handling and resist baking. It is designed to be able to apply high quality resist film on a wide range of substrate shapes, sizes and topologies with consistent and uniform results. This new lithography resist coater is anticipated to enhance the quality, repeatability and throughput of NanoFab precision lithographic imaging. more...
For more information, contact Liya Yu, 301-975-4590.