Secondary Ion Mass Spectrometer for Ion Milling System
A new Hiden Analytical IMP 301 secondary ion mass spectrometer (SIMS) has been integrated into the NanoFab’s 4Wave Ion Milling System, located in cleanroom bay A106. The module can reliably determine the etching endpoints at or near the interface of almost any two dissimilar materials, allowing users to terminate etches with better than 0.2 nm accuracy. The SIMS can be programmed for multi-step processes, and detects the composition of ion mill by-products for up to four materials at one time.
For more information, contact Gerard Henein, 301-975-5645, email@example.com.
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