The NIST Center for Nanoscale Science and Technology (CNST) supports the U.S. nanotechnology enterprise from discovery to production by providing industry, academia, NIST, and other government agencies with access to world-class nanoscale measurement and fabrication methods and technology.
The CNST's shared-use NanoFab gives researchers economical access to and training on a commercial state-of-the-art tool set required for cutting-edge nanotechnology development. The simple application process is designed to get projects started in a few weeks.
Looking beyond the current commercial state of the art, the CNST's NanoLab offers opportunities for researchers to collaborate on creating and using the next generation of nanoscale measurement instruments and methods. more...
New Identification Requirements for Entering the Nist Gaithersburg Campus
Beginning July 21, 2014, the identification requirements for entering the NIST site have changed as required by the 2005 “Real ID” Act. Driver’s licenses from eleven U.S. states (Alaska, Arizona, Kentucky, Louisiana, Maine, Massachusetts, Minnesota*, Montana, New York*, Oklahoma, Washington state*) and American Samoa will no longer be accepted as identification for U.S. citizens. Visitors with these licenses will need to present an approved form of alternative identification to gain access to NIST. State-issued Enhanced Driver’s Licenses from Minnesota, New York, and Washington state, which are identifiable by an American flag icon, may be used as valid identification for access to NIST.
New Light Scattering and Field Flow Fractionation System Now Available
A new Wyatt Light Scattering/Field Flow Fractionation System has been installed in room 216/G101. The system integrates several methods of field flow fractionation and light scattering to separate and measure nanoparticles in solution. It is capable of separating nanoparticle samples with a highly polydisperse size distribution into sub-samples of nanoparticles of nearly monodisperse size, can measure the nanoparticle size distribution, and can perform simultaneous static and dynamic light scattering on monodisperse sub-samples of nanoparticles.
For additional information, please contact Joshua Schumacher, 301-975-8065.
New Hydrofluoric Acid (HF) Vapor Etcher Now Available
A new SPTS µEtch stand-alone hydrofluoric acid vapor etcher has been installed in the cleanroom in room 215/B102. This tool uses a combination of liquid hydrofluoric acid and alcohol to create a vapor that isotropically etches silicon dioxide without etching silicon. Applications include fabricating microelectromechanical systems and nanoelectromechanical (MEMS/NEMS) such as accelerometers, ink jet heads, and pressure sensors. The tool is capable of etching a sacrificial layer of silicon dioxide underneath the silicon device layer in order to create microscale and nanoscale silicon structures that are freely suspended.
For more information, contact Liya Yu, 301-975-4590.