Subnanometer Wavelength Metrology of Lithographically Prepared structures: A Comparison of Neutron and X-Ray Scattering

Published

May 1, 2003

Author(s)

D Casa, R Jones, Theodore V. Vorburger, Ndubuisi George Orji, G Barclay, P Bolton, W Wu, E Lin, T Hu

Abstract

The challenges facing current metrologies based on SEM, AFM, and light scatterometry for technology nodes of 157 nm imaging and beyond suggest that the development of new metrologies capable of routine measurement in this regime are required. We provide results of initial tests of a measurement technique based on Small Angle X-ray Scattering (SAXS) capable of rapid measurements of test samples produced using conventional test masks without significant sample preparation. Using a sample photoresist grating, the technique is shown to apply equally to both organic, including photoresist, and inorganic patterns, including metal and oxide. The sub-Angstrom wavelength provides nanometer level resolution, with significant room for increasing resolution to sub-nanometer levels. The current technique is shown as a dramatic improvement over prior attempts using neutron scattering, both in resolution, but also in its practical application within industry.

Proceedings Title

Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XVII, Daniel J. Herr, Editor

Volume

5038

Conference Dates

February 24, 2003

Conference Location

Santa Clara, CA, USA

Conference Title

Scatterometry

Pub Type

Conferences

Keywords

lithgraphy, nanostructures neutron scattering, pattern metrology, x-ray scattering

Citation

Casa, D. , Jones, R. , Vorburger, T. , Orji, N. , Barclay, G. , Bolton, P. , Wu, W. , Lin, E. and Hu, T. (2003), Subnanometer Wavelength Metrology of Lithographically Prepared structures: A Comparison of Neutron and X-Ray Scattering, Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XVII, Daniel J. Herr, Editor, Santa Clara, CA, USA (Accessed April 16, 2024)