Benck, E.
, Golubiatnikow, G.
, Fraser, G.
, Ji, B.
, Motika, S.
and Karwacki, E.
(2003),
Submillimeter-Wavelength Plasma Chemical Diagnostics for Semiconductor Manufacturing, Journal of Vacuum Science and Technology B
(Accessed April 25, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Submillimeter-Wavelength Plasma Chemical Diagnostics for Semiconductor Manufacturing
Published
Author(s)
, G Y. Golubiatnikow, , B Ji, S A. Motika, E J. Karwacki
Abstract
Submillimeter-wavelength, linear-absorption spectroscopy has been applied to the chemical diagnostics of a reactive-ion etching plasma in a modified capacitively coupled Gaseous Electronics Conference (GEC) reactor. Approximately 1 mW of narrow-band (Citation
Journal of Vacuum Science and Technology B
Volume
21
Issue
No. 5
Pub Type
Journals
Keywords
absorption spectroscopy, backward-wave oscillator, plasma diagnostic, submillimeter-wavelength
Citation
Created September 1, 2003, Updated February 17, 2017