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Displaying 1 - 4 of 4

Alternatives to aluminum gates for silicon quantum devices: Defects and strain

September 15, 2021
Author(s)
Ryan Stein, Zachary Barcikowski, Sujitra Pookpanratana, Joshua M. Pomeroy, Michael Stewart
Gate-defined quantum dots (QD) benefit from the use of small grain size metals for gates materials because it aids in shrinking the device dimensions. However, it is not clear what differences arise with respect to process-induced defect densities and

Developing Single Layer MOS Quantum Dots for Diagnostic Qubits

December 28, 2020
Author(s)
Yanxue Hong, Aruna Ramanayaka, Ryan Stein, Joshua M. Pomeroy
The design, fabrication and characterization of single metal gate layer, metal-oxide- semiconductor (MOS) quantum dot devices robust against dielectric breakdown are presented as prototypes for future diagnostic qubits. These devices were developed as a

Reduction of charge offset drift using plasma oxidized aluminum in SETs

October 26, 2020
Author(s)
Yanxue Hong, Ryan Stein, Michael Stewart, Neil M. Zimmerman, Joshua M. Pomeroy
Aluminum oxide (AlOx)-based single-electron transistors (SETs) fabricated in ultra-high vacuum (UHV) chambers using in situ plasma oxidation show excellent stabilities over more than a week, enabling applications as tunnel barriers, capacitor dielectrics

The effect of strain on tunnel barrier height in silicon quantum devices

July 13, 2020
Author(s)
Ryan Stein, Michael Stewart
Semiconductor quantum dot (QD) devices experience a modulation of the band structure at the edge of lithographically defined gates due to mechanical strain. This modulation can play a prominent role in the device behavior at low temperatures, where QD