March 27, 2007
Author(s)
Thomas Mitchell (Mitch) Wallis, Atif A. Imtiaz, Hans Nembach, Paul Rice, Pavel Kabos
Two metrological tools for high frequency measurements of nanoscale systems are described: (i) tow/N-port analysis of nanoscale devices as well as (ii) near-field scanning microwave microscopy (NSMM) for materials characterization. Calibrated two/N-port