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Search Publications by: Yicheng Wang (Fed)

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Displaying 26 - 50 of 68

Electron Drift in C4F6 and C4F6/Ar Mixtures

September 1, 2002
Author(s)
Amanda N. Goyettes, Yicheng Wang, Gerald FitzPatrick
We report measurements of electron drift velocities as a function of density-reduced electric field, w(E/N), for hexafluorobutadiene (C4F6) and mixtures of C4F6 with Ar. The w(E/N) for the mixtures of C4F6 with Ar can aid Boltzmann transport equation

Rate Constants for Unimolecular Decomposition of SF 6 -

November 21, 2001
Author(s)
Yicheng Wang, R. Champion, I. V. Dyakov, B. Peko
Insulating gas mixtures containing SF 6 have been promoted to serve as replacements for pure SF 6 in order to reduce SF 6 atmospheric emission. It has been argued that some synergism may be achieved by choosing proper buffer gases in mixtures with SF 6

Collisional Decomposition of SF 6

September 1, 2000
Author(s)
R. Champion, I. V. Dyakov, Yicheng Wang
Insulating gas mixtures containing SF 6 have been promoted to serve as replacements for pure SF 6 in order to reduce SF 6 atmospheric emission. It has been argued that some synergism may be achieved by choosing proper buffer gases in mixtures with SF 6

Inductively Coupled Plasmas in Low Global Warming Potential Gases

August 1, 2000
Author(s)
Amanda N. Goyettes, Yicheng Wang, James K. Olthoff
Many high density discharges used in microelectronics fabrication use fluorocarbon gases with coincidentally high global-warming potentials (GWPs). We have determined the identities, fluxes, and energy distributions of ions produced in high density

Studies of Ion Bombardment in High Density Plasmas Containing CF 4

July 1, 1999
Author(s)
James K. Olthoff, Yicheng Wang
We report ion energy distributions, relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively coupled Gaseous Electronics Conference radio-frequency reference cell for discharges generated in pure C 4

Electron Drift and Attachment in CHF 3 and its Mixtures With Argon

May 1, 1999
Author(s)
Yicheng Wang, Loucas G. Christophorou, James K. Olthoff, J. K. Verbrugge
Measurements are reported of the electron drift velocity, w, in CHF 3 gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate constant (-