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Displaying 51 - 75 of 115

Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography

July 1, 2003
Author(s)
Charles S. Tarrio, S Grantham, M B. Squires, Robert E. Vest, Thomas B. Lucatorto
Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer EUV stepper mirrors require the highest attainable reflectivity at 13 nm

Design and Performance of Capping Layers for EUV Multilayer Mirrors

June 1, 2003
Author(s)
Sasa Bajt, H N. Chapman, Nhan Nguyen, J Alameda, J C. Robinson, M Malinowski, E Gullikson, Andrew Aquila, Charles Tarrio, Steven Grantham
The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of utmost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in

Facility for Extreme Ultraviolet Reflectometry of Lithography Optics

February 1, 2003
Author(s)
Charles S. Tarrio, S Grantham, Thomas B. Lucatorto
Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in

Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application

January 1, 2003
Author(s)
Zachary H. Levine, S Grantham, Charles S. Tarrio, D Paterson, I McNulty, T M. Levin, A L. Ankudinov, J J. Rehr
The mass absorption coefficient of tungsten and tantalum was measured with soft x-ray photons from 1450 eV to 2350 eV using an undulator source. This includes the M 3, M 4, and M 5 absorption edges. X-ray absorption fine structure was calculated within a

Characterisation of the Response of Chromium-Doped Alumina Screens in the Vacuum Ultraviolet Using Synchrotron Radiation

December 1, 2002
Author(s)
James K. McCarthy, A Baciero, B Zurro, Uwe Arp, Charles Tarrio, Thomas B. Lucatorto, A Morono, P Martin, E R. Hodgson
We have measured the response of chromium-doped alumina screens to vacuum ultraviolet radiation and derived quantum efficiency curves for the energy range from 30 to 300 eV. A model is presented to explain the structure in this curve. In addition, the

First Results From the Updated NIST/DARPA EUV Reflectometry Facility

July 1, 2002
Author(s)
S Grantham, Charles Tarrio, M B. Squires, Thomas B. Lucatorto
Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in

Upgrades to the NIST/DARPA EUV Reflectometry Facility

December 1, 2001
Author(s)
Charles S. Tarrio, Thomas B. Lucatorto, S Grantham, M B. Squires, Uwe Arp, Lu Deng
We have recently installed a new sample chamber at the NIST/DARPA EUV Reflectometry Facility at the National Institute of Standards and Technology. The chamber replaces a much smaller system on Beamline 7 at the Synchrotron Ultraviolet Radiation Facility

Tomography of Integrated Circuit Interconnects

October 1, 2001
Author(s)
Zachary H. Levine, A R. Kalukin, M Kuhn, S P. Frigo, I McNulty, C C. Retsch, Y Wang, Uwe Arp, Thomas B. Lucatorto, Bruce D. Ravel, Charles S. Tarrio
00 Word summary based on the paper:Z. H. Levine, A. R. Kalukin, M. Kuhn, S. P. Frigo, I. McNulty,>C. C. Retsch, Y. Wang, U. Arp, T. B. Lucatorto, B. D. Ravel, and C. Tarrio,>``Microtomography of Integrated Circuit Interconnect with an> Electromigration

Absolute Extreme Ultraviolet Metrology

August 1, 2001
Author(s)
Charles S. Tarrio, Robert E. Vest, S Grantham
NIST has a long-standing program for the calibration of extreme ultraviolet optical components. Begun with the advent of the Synchrotron Ultraviolet Radiation Facility (SURF) almost 40 years ago, early activities centered on the development and

Evaluating Optical Materials

May 1, 2001
Author(s)
Charles S. Tarrio, Thomas B. Lucatorto
curately quantifying optical constants is key to fabricating successful multiplayer film components

Advanced Optics Characterization

February 1, 2001
Author(s)
Angela Davies, Charles S. Tarrio, Christopher J. Evans
Science, commerce, and defense continuously drive the optical community to provide less expensive, more perfect products. High performance optical systems always demand tighter tolerances-and tighter tolerances drive the need for ever better metrology

Extreme Ultraviolet Metrology at SURF III

January 1, 2001
Author(s)
Charles S. Tarrio, Robert E. Vest, S Grantham, Thomas B. Lucatorto
The last two decades have seen the development normal-incidence multiplayer mirrors and semiconductor photodiodes for extreme ultraviolet (EUV) radiation. Applications such as in astrophysics, lithography, and plasma physics, require precise calibrations