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Search Publications by: Cedric J Powell (Assoc)

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Displaying 326 - 350 of 378

Material Dependence of Electron Inelastic Mean Free Paths at Low Energies

January 1, 1990
Author(s)
Shigeo Tanuma, Cedric J. Powell, David R. Penn
We have calculated electron inelastic mean free paths (IMFPs) for 50-2000 eV electrons in 31 materials (27 elements and 4 compounds). We present and discuss in this paper IMFP data for aluminum and gold in the 50-2000 ev Range. Substantial differences are

Quantitative Surface Analysis by Electron Spectroscopy

April 1, 1978
Author(s)
Cedric J. Powell
An overview is given of a new cooperative project under the Implementing Agreement between the Technology Administration, U.S. Department of Commerce, and the Agency of Industrial Science and Technology, Japanese Ministry of International Trade and

Surface Analysis by Electron Spectroscopy at High Pressures

March 1, 1978
Author(s)
Cedric J. Powell
Surface analyses are now made by techniques such as Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS), and appearance potential spectroscopy (APS). These techniques utilize low-energy electrons and have high surface sensitivity but

Auger Electron Spectroscopy

February 1, 1978
Author(s)
Cedric J. Powell
A convenient measure of surface sensitivity in Auger-electron spectroscopy (AES) and x-ray photoelectron spectroscopy (XPS) is the mean escape depth (MED). If the effects of elastic-electron scattering are neglected, the MED is equal to the electron

Quantitative Surface Analysis by X-Ray Photoelectron Spectroscopy

January 1, 1978
Author(s)
Cedric J. Powell
Measurements have been made of the relative intensities of the principal features in X-ray photoelectron spectra of indium, lead, and aluminum oxide and compared with those expected from a simple model for the photoemission process. Systematic effects in

Surface Characterization: Present Status and the Need for Standards

January 1, 1978
Author(s)
Cedric J. Powell
A summary is given of the present status and use of surface-characterization measurements in the United States. Attention is primarily devoted to those properties needed to characterize a solid surface, specifically the determination of surface composition
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