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Search Publications by: William D. Phillips (Fed)

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Displaying 101 - 125 of 166

Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers

September 1, 1995
Author(s)
K K. Berggren, A Bard, J L. Wilbur, John D. Gillaspy, A G. Helg, Jabez J. McClelland, S Rolston, William D. Phillips, M Prentiss, G M. Whitesides
Lithography can be performed with beams of neutral atoms in metastable excited states to pattern self-assembled monolayers (SAMs) of alkanethiolates on gold. An estimated exposure of a SAM of dodecanethiolate (DDT) to 15 to 20 metastable argon atoms per