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Search Publications by: John A. Kramar (Fed)

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Displaying 51 - 67 of 67

Towards a Traceable Nanoscale Force Standard

May 1, 2001
Author(s)
Jon R. Pratt, David B. Newell, Edwin R. Williams, Douglas T. Smith, John A. Kramar
The National Institute of Standards and Technology has launched a five-year project to traceably link the International System of Units (SI) to forces between 10 -8N and 10 -2N. In this paper, we give a background and overview of this project, discuss the

Kinematic Modeling and Analysis of a Planar Micro-Positioner

January 1, 2001
Author(s)
Nicholas G. Dagalakis, John A. Kramar, E Amatucci, Robert Bunch
The static and dynamic performance of a control system depends on the accuracy of the mathematical model of the plant that is being controlled. In this work, the accuracies of a linear and a second-order kinematic model were evaluated for a two-dimensional

Molecular Measuring Machine Design and Performance

January 1, 2001
Author(s)
John A. Kramar, Jay S. Jun, William B. Penzes, Vincent P. Scheuerman, Fredric Scire, E C. Teague
We have developed a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing two-dimensional point-to-point measurements with nanometer-level uncertainties over a 50 mm by 50 mm area. The scanning tunneling microscope

SI Traceability of Force at the Nanonewton Level

January 1, 2001
Author(s)
David B. Newell, Jon R. Pratt, John A. Kramar, Douglas T. Smith, L Feeney, Edwin R. Williams
Although nanonewton force measurements are commonplace in industry, no National Measurement Institute supports a link to the International System of Units (SI) below one newton. The National Institute of Standards and Technology has launched a five-year

Molecular Measuring Machine Design and Measurements

May 1, 2000
Author(s)
John A. Kramar, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
We at the National Institute of Standards and Technology are building a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing nanometer-accuracy, two-dimensional, point-to-point measurements over a 50 mm by 50 mm area

Performance Evaluation of a Parallel Cantilever Biaxial Micropositioning Stage

January 1, 2000
Author(s)
E Amatucci, Nicholas Dagalakis, John A. Kramar, Fredric Scire
The phenomenal growth of opto-electronic manufacturing and future applications in micro and nano manufacturing has raised the need for low-cost high performance micro-positioners. The National Institutes of Standards and Technology (NIST) Advanced

Grating Pitch Measurements With the Molecular Measuring Machine

November 1, 1999
Author(s)
John A. Kramar, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
At the National Institute of Standards and Technology, we are building a metrology instrument called the Molecular Measuring Machine (M^3) with the goal of performing nanometer- accuracy two-dimensional feature placement measurements over a 50 mm by 50 mm

Toward Nanometer Accuracy Measurements

June 1, 1999
Author(s)
John A. Kramar, E Amatucci, David E. Gilsinn, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one nanometer accuracy cover a 50 mm by 50 mm area. The instrument combines a scanning tunneling

The Molecular Measuring Machine

January 1, 1998
Author(s)
John A. Kramar, E Gilsinn, E Amatucci, C Villarrubia, E C. Teague, W Scire, William B. Penzes
To help meet the measurement needs of industries preparing to manufacture future generations of nanoelectronic devices and circuits, the National Institute of Standards and Technology (NIST) has designed and built an instrument¿called the Molecular

Measurement of Patterned Film Linewidth for Interconnect Characterization

January 1, 1995
Author(s)
L Linholm, Robert Allen, Michael W. Cresswell, Rathindra Ghoshtagore, S Mayo, H Schafft, John A. Kramar
The results from high-quality electrical and physical measurements on the same cross-bridge resistor test structure with approximately vertical sidewalls have shown differences in linewidth as great as 90 nm for selected conductive films. These differences

Hertzian Contact Resonances

January 1, 1994
Author(s)
John A. Kramar, T Mcwaid, J Schneir, E C. Teague
The resonant frequency of a sphere in contact with a flat surface was measured as a function of loading force for contacting materials with different elastic moduli. Comparisons were made with predictions based on the Hertzian theory of elastic deformation