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Displaying 48126 - 48150 of 74066

Effects of Annealing on UHMWPE Molecular Orientation

January 1, 2000
Author(s)
S Sambasvian, Daniel A. Fischer, M C. Shen, John A. Tesk, Stephen M. Hsu
Ultra-high molecular weight polyethylene (UHMWPE) is the dominant material used in artificial joints due to its outstanding wear resistance. At the same time, UHMWPE wear debris has been found to contribute to the loosening of the im-plants. As life

Electron Interactions with CF 3 I

January 1, 2000
Author(s)
Loucas G. Christophorou, James K. Olthoff
Low-energy electron collision data for the plasma processing gas CF 3I are sparse. Limited cross section data are available only for total and differential elastic electron scattering, electron-impact ionization, and electron attachment processes. These

Electron Interactions With SF 6

January 1, 2000
Author(s)
Loucas G. Christophorou, James K. Olthoff
Sulfur hexafluoride (SF 6) is commonly used as a gaseous dielectric and as a plasma etching gas. In this work, the state of knowledge on electron-interaction cross sections and electron-swarm parameters in SF 6 is comprehensively reviewed and critically

Electronic Display and Imaging Metrology at NIST

January 1, 2000
Author(s)
Edward F. Kelley
The activities at the National Institute of Standards and Technology (NIST) in the areas of photonics, optoelectronics, imaging, displays, photometry and colorimetry are broadband and ubiquitous. The main emphasis of this presentation is on the activities

Electrostatically Driven Polymer Translocation Through a Narrow Pore

January 1, 2000
Author(s)
Z Konkoli, T Ambjornsson, S P. Apell, John J. Kasianowicz
We studied theoretically how single-stranded DNA enters a nanometer-scale pore. We describe the flux of DNA molecules into the pore as a function of the applied electrostatic potential. The number of polynucleotide segments that entered the pore's entrance
Displaying 48126 - 48150 of 74066