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PUBLICATIONS

Scanning Capacitance Microscopy Measurements and Modeling: Progress Towards Dopant Profiling of Silicon

Published

Author(s)

Joseph Kopanski, Jay F. Marchiando, J R. Lowney
Proceedings Title
Proc., International Workshop on the Measurement and Characterization of Ultrashallow Doping Profiles in Semiconductors
Conference Dates
March 20-22, 1995
Conference Location
Research Triangle Park, NC, USA
Pub Type
Conferences

Citation

Kopanski, J. , Marchiando, J. and Lowney, J. (1995), Scanning Capacitance Microscopy Measurements and Modeling: Progress Towards Dopant Profiling of Silicon, Proc., International Workshop on the Measurement and Characterization of Ultrashallow Doping Profiles in Semiconductors, Research Triangle Park, NC, USA (Accessed April 18, 2024)

Created December 30, 1995, Updated October 12, 2021