Nanostructure Fabrication via Direct Writing with Atoms Focused in Laser Fields

Published

May 1, 1994

Author(s)

R E. Scholten, Jabez J. McClelland, E C. Palm, A Gavrin, Robert Celotta

Abstract

The techniques of atom optics can be applied during the deposition of atoms onto a surface to produce nanostructures. A laser is used to form a standing wave intensity pattern in front of the substrate. An atom beam, which has been collimated by optical means, is focused onto the substrate by dipole forces from the standing wave pattern so as to deposit a series of lines spaced by half the laser wavelength. We describe the fabrication of a Cr nanograting formed using this new technique. The experimental arrangement for deposition and the optical collimation of the atom beam are described. Scanning electron microscopy (SEM) and atomic force microscopy (AFM)images of the resulting nanostructures are presented.

Citation

Journal of Vacuum Science and Technology B

Volume

12

Issue

3

Pub Type

Journals

Citation

Scholten, R. , McClelland, J. , Palm, E. , Gavrin, A. and Celotta, R. (1994), Nanostructure Fabrication via Direct Writing with Atoms Focused in Laser Fields, Journal of Vacuum Science and Technology B (Accessed April 16, 2024)