The National Institute of Standards and Technology (NIST) has been developing methods and standards to enable the traceable calibration of critical dimension atomic force microscopy (CD AFM). This technique involves flared tips and two-dimensional surface sensing to enable scanning of features with near-vertical sidewalls. A major source of uncertainty in metrology with CD-AFM metrology is the calibration of the tip width. With a new generation of the NIST single crystal critical dimension reference material (SCCDRM) project, we are hoping to reach expanded uncertainties (k = 2) below 1 nm.
Citation: Abstract book for Frontier Conference
Pub Type: Others
AFM, linewidth, SCCDRM, lattice-selective etch, standard