A method for fabricating binary amplitude holograms from a dyed photoresist is described. It is of particular interest for holograms that are used as null lenses in the form metrology of aspheric surfaces and wavefronts. A pigment that strongly absorbs light near 633 nm was dissolved in a positive photoresist and the dyed resist was spun onto silica glass substrates. Stable resist layers were obtained, that were essentially opaque at 633 nm with little effect on the transmittance of the resist in the ultraviolet. A Fresnel zone plate was fabricated from the dyed resist layer using contact lithography at 436 nm (g-line), and its performance was demonstrated at 633 nm.
Citation: Optics Letters
Pub Type: Journals
diffractive optics, lithography