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Trevor Braun

Publications

Simulation of Copper Electrodeposition in Through-Hole Vias

Author(s)
Trevor M. Braun, Daniel Josell, Thomas P. Moffat, Jimmy John
Copper electrodeposition processes for filling metallized through-hole (TH) and through-silicon vias (TSV) depend on selective breakdown of a co-adsorbed
Created October 23, 2018