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Simon G. Kaplan (Fed)

Simon Kaplan's research interests include spectrophotometry and radiometry. He has worked on the characterization of optical materials and components in support of UV photolithography and infrared remote sensing applications. Currently he leads the Low Background Infrared (LBIR) project for absolute detector-based irradiance and radiance calibrations in support of missile defense as well as climate monitoring technology.

He was awarded a NIST Bronze Medal in 2013 for contributions to the calibration accuracy of NOAA infrared environmental satellites.

Research projects

Absolute cryogenic infrared radiometry

DUV sources and materials characterization

Fourier transform infrared spectrophotometric (FTIS) facility

Publications

Index of refraction of germanium

Author(s)
John H. Burnett, Eric C. Benck, Simon G. Kaplan, Erik Stover, Adam Phenis
Measurements of the index of refraction of a sample of high-quality, single-crystal germanium using the minimum deviation refractometry method are presented for

Refractive index measurements of Ge

Author(s)
John H. Burnett, Simon G. Kaplan
A program has been started at NIST to make high-accuracy measurements of the infrared (IR) index properties of technologically important IR materials, in order

Infrared Optical Properties of Materials

Author(s)
Simon G. Kaplan, Leonard M. Hanssen, Raju V. Datla
This document describes the Fourier Transform Infrared Spectrophotometry (FTIS) Facility at the Sensor Science Division (SSD) of the National Institute of

Chapter 4: Fourier transform methods

Author(s)
Simon G. Kaplan, Manuel A. Quijada
Chapter 4 describes the use of Fourier Transform Spectrometers (FTS) for accurate spectrophotometry over a wide spectral range. After a brief exposition of the
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Selected Publications

Angle-dependent infrared reflectance measurements in support of VIIRS
Intercomparison of regular spectral transmittance and reflectance measurements with monochromator and FTIR based spectrophotometers
High index optical materials for 193 nm immersion lithography
Created October 9, 2019, Updated November 10, 2020