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John A. Small

Chief, Materials Measurement Science Division, Material Measurement Laboratory

Dr. Small has been the Division Chief of the Materials Measurement Science Division at the National Institute for Standards and Technology (NIST) since its creation in 2012 and before that he was the Division Chief of the Surface and Microanalysis Science Division. He joined NIST, then the National Bureau of Standards (NBS) in January 1976 as a Post-Doctoral Research Fellow. During his career with NBS/NIST, his research interests have included: The development of a method for the quantitative analysis and imaging of particles at the nanometer- to micrometer-size range using techniques such as x-ray microanalysis and electron backscatter diffraction, establishment of an accuracy base for the measurement of environmental asbestos including the production of the first NBS asbestos SRM, modeling of x-ray bremsstrahlung radiation, development of advanced x-ray detectors including microcalorimeter and silicon drift x-ray detectors and low voltage electron beam x-ray microanalysis.


·   Department of Commerce Gold Medal Award (2010)

·   Department of Commerce Bronze Medal Award (1988)

·   The Microbeam Analysis Society’s (MAS) Macres Award for Best Instrumentation/Software Paper (1988)

·   Microbeam Analysis Society Presidential Service Award (1997)

·  Chemical Science and Technology Laboratory’s Technical Achievement Award (1998)

·   Elected to Sigma Xi (1977)


·   NIST Representative, Surface Analysis Working Group for the Consultative Committee for Amount of Substance under the International Committee for Weights and Measures. (2007-2011)

·   NIST Representative on the Nanotechnology Environmental and Health Implications (NEHI) interagency Working Group (2005-2009)

·   NIST Representative Interagency Microbial Forensics Assessment Board. (2012 – 2013)

·   Secretary ISO TC 202 SC 1: Microbeam Analysis.

·   President MAS (1993)


Characterization of SiGe Films for use as a National Institute of Standards and Technology (NIST) Microanalysis Reference material (RM 8905)

Ryna B. Marinenko, Shirley Turner, David S. Simons, Savelas A. Rabb, Rolf L. Zeisler, Lee L. Yu, Dale E. Newbury, Rick L. Paul, Nicholas W. Ritchie, Stefan D. Leigh, Michael R. Winchester, Lee J. Richter, Douglas C. Meier, Keana C. Scott, D Klinedinst, John A. Small
Bulk SiGe wafers cut from single-crystal boules and two SiGe thick films (4 m and 5 m thick) on Si wafers were evaluated with the electron probe microanalyzer

Electron Probe Microanalysis with Cryogenic Detectors

Dale E. Newbury, Kent D. Irwin, Gene C. Hilton, David A. Wollman, John A. Small, John M. Martinis
Electron probe x-ray microanalysis is based upon the use of a focused, high current density electron beam, 5 keV to 30 keV in energy, to excite characteristic x
Created August 6, 2019