Mr. Potzick is a guest researcher in the Nanoscale and Nanostructure Metrology Group in the Microsystems and Nanotechnology Division of the Physical Measurement Laboratory (PML) at the National Institute of Standards and Technology (NIST). He has been involved in the accurate measurement of various physical quantities at NIST for over 20 years. Currently, Mr. Potzick is the Project Leader for Optical Dimensional Metrology in the Nanoscale Metrology Group. Prior to this, he developed improved methods for measuring the mass flowrate of gases, gas temperature, humidity, and dynamic forces.
Mr. Potzick is the author of over 78 technical publications in the fields of fluids, mechanics, electronics, acoustics, dimensional metrology, and theory of measurement, and owner of three patents. He is responsible for the production and integrity of the NIST photomask linewidth standards SRM 475, 476, 473, and 2059, and conceived and built the first Stewart Platform metrology microscope. He received the Best Paper Award at the 1997 Measurement Science Conference, the Dept of Commerce Bronze Medal in 1999, and the Dept of Commerce Silver Medal in 2006.
He has an M.S. degree in Physics, is active on SEMI Standards committees, and is a member of SPIE (Society of Photo-optical Engineers), and the BACUS photomask working group.
NIST Standard Reference Material SRM 2800 Microscope Magnification Standard
NIST Standard Reference Material 2059 Photomask Linewidth Standard
NIST UV Scanning Microscope