Dr. Falk Niefind is a physical chemist in the Nanoscale Device Characterization Division (NDCD) of the Physical Measurement Laboratory (PML) at the National Institute of Standards and Technology (NIST). He joined the NDCD as a postdoctoral associate within the Nanoscale Imaging Group, working primarily on advancing photoemission electron microscopy (PEEM) metrology.
Prior to joining NIST, Dr. Niefind obtained his PhD with a project that focused on imaging polymer thin films with a combination of PEEM and a polarized laser light source. These polymer films are the active components in organic electronic devices, e.g., organic solar cells and their performance depends on their nanoscale structure. For deconvoluting the nanostructure, he is interested in applying computational analysis methodologies to the PEEM micrographs.
For information about his publications, please visit https://orcid.org/0000-0003-3455-1161.