The National Institute of Standards and Technology has provided and continues to provide critical metrology development for the semiconductor manufacturing industry as it moves from the microelectronic era into the nanoelectronic era. This presentaion will describe the National Semiconductor Metrology Program, including a detailed discussion of several projects: Nanolithography Using Scanning Probe Oxidation; Atomic-Level Film Characterization; and Nanoelectronic Device Characterization.
Conference Dates: March 7-11, 2004
Conference Location: Boston, MA
Conference Title: 2004 Nanotechnology Conference and Trade Show
Pub Type: Conferences
gate dielectrics, molecular electronics, nanoelectronics, nanolithography, thin films