The development of a very fast, very accurate laser stage measurement system facilitates a new method to enhance the image and line scan resolution of scanning electron microscopes (SEMs). This method, allows for fast signal intensity and displacement measurements, and can report hundreds of thousands of measurement points in just a few seconds. It is possible then, to account for the stage position in almost real time with a resolution of 0.2 nm. The extent and direction of the stage motion reveal important characteristics of the stage vibration and drift, and helps to minimize them. The high accuracy and speed also allows for a convenient and effective technique for diminishing these problems by correlating instantaneous position and imaging intensity. The new measurement technique gives a possibility for significantly improving SEM-based dimensional measurement quality.
Proceedings Title: Proceedings of SPIE
Issue: Part 2
Conference Dates: February 23, 2004
Conference Location: Santa Clara, CA
Conference Title: Metrology, Inspection, and Process Control for Microlithography XVIII, Richard M. Silver, Editor May 2004, Poster Session
Pub Type: Conferences
CD-SEM, enhancement, image, interferometer, laser, resolution, scanning electron microscope, SEM, stage