Photomask linewidth standards serve as primary standards for the calibration of photomask metrology tools and are available from the national standards organizations of several countries. These standards are often in the form of chrome-on-quartz photomasks with a variety of linewidth, spacewidth, and pitch patterns. The British and U.S. national laboratories have made comparative measurements of linewidth, spacewidth, and pitch on two national photomask linewidth standards in order to detect any systematic differences between their respective calibration systems. The measurement differences were all found to be within the calibration expanded uncertainties of both laboratories combined, and are not significant at the 95% confidence level.
Proceedings Title: Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography X, Susan K. Jones, Editor
Conference Dates: March 11, 1996
Conference Location: Santa Clara, CA
Conference Title: Standards and Calibration Methods for Critical Dimension Metrology
Pub Type: Conferences
accuracy, calibration, critical dimension, international standard, linewidth, measurement standard, photomask, pitch