Wang, M.
, Lin, E.
, Karim, A.
and Fasolka, M.
(2003),
Combinatorial Methods Study of Confinement Effects on the Reaction Front in Ultrathin Chemically Amplified Photoresists, Characterization and Metrology for ULSI Technology: 2003 International Conference, Austin, TX, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853895
(Accessed April 19, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Combinatorial Methods Study of Confinement Effects on the Reaction Front in Ultrathin Chemically Amplified Photoresists
Published
Author(s)
M Wang, , ,
Conference Location
Austin, TX
Conference Title
Characterization and Metrology for ULSI Technology: 2003 International Conference
Pub Type
Conferences
Download Paper
Keywords
Combinatorial and THE Methods, Lithography, Thin Films, chemically amplified resist, combinatorial method, thin film
Citation
Created December 31, 2002, Updated October 12, 2021