We use a measurement method designed for coupled lines on highly conductive substrates to characterize identical asymmetric coupled lines fabricated on lossy silicon with and without a metalization plane beneath the two signal conductors. The study illustrates the important role of the return path in determining the electromagnetic coupling between the lines.
Conference Dates: October 23-25, 2001
Conference Location: Boston, MA
Conference Title: 2001 Elect. Perform. of Electronic Pkg.
Pub Type: Conferences
asymmetric coupled lines, ground return path, on-wafer measurement