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Characterization of Prototype Silicon Pitch Artifacts Fabricated by Scanning Probe Lithography and Anisotropic Wet Etching

Published

Author(s)

F S. Chien, W F. Hsieh, S Gwo, Jay S. Jun, Richard M. Silver, Andras Vladar, John A. Dagata
Citation
Journal of Applied Physics
Volume
23
Issue
No. 1

Keywords

nanofabrication, pattern placement error, probe oxidation, scanning

Citation

Chien, F. , Hsieh, W. , Gwo, S. , Jun, J. , Silver, R. , Vladar, A. and Dagata, J. (2005), Characterization of Prototype Silicon Pitch Artifacts Fabricated by Scanning Probe Lithography and Anisotropic Wet Etching, Journal of Applied Physics (Accessed March 29, 2024)
Created December 31, 2004, Updated October 12, 2021